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Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt

Jezik EngleskiEngleski
Knjiga Meki uvez
Knjiga Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt Stanley D Crozier
Libristo kod: 08143237
Nakladnici Biblioscholar, listopad 2012
The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characte... Cijeli opis
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The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characterize as potential metamaterials. This is achievable by developing a fabrication recipe to include exposure methods, exposure dosages, and material development. This study developed an interference lithography capability at AFIT for the first time with period resolution below 230nm. It also identified initial acceptable photoresist materials and exposure dosages, and a path to follow to optimize this process.

Informacije o knjizi

Puni naziv Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt
Autor Stanley D Crozier
Jezik Engleski
Uvez Knjiga - Meki uvez
Datum izdanja 2012
Broj stranica 96
EAN 9781249829553
ISBN 9781249829553
Libristo kod 08143237
Nakladnici Biblioscholar
Težina 186
Dimenzije 189 x 246 x 5

Kategorija

Society & Social Sciences > Education
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