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Chemical Vapor Deposition

Jezik EngleskiEngleski
Knjiga Meki uvez
Knjiga Chemical Vapor Deposition Srinivasan Sivaram
Libristo kod: 02254097
Nakladnici Springer-Verlag New York Inc., lipanj 2013
This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively funda... Cijeli opis
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This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions.

Informacije o knjizi

Puni naziv Chemical Vapor Deposition
Autor Srinivasan Sivaram
Jezik Engleski
Uvez Knjiga - Meki uvez
Datum izdanja 2013
Broj stranica 292
EAN 9781475747539
ISBN 1475747535
Libristo kod 02254097
Nakladnici Springer-Verlag New York Inc.
Težina 474
Dimenzije 155 x 235 x 17

Kategorija

Technology, Engineering, Agriculture > Electronics & communications engineering > Electronics engineering > Electronics: circuits & components
Technology, Engineering, Agriculture > Technology: general issues > Engineering: general
Technology, Engineering, Agriculture > Energy technology & engineering > Electrical engineering
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